Micro-spot size Reflection and Transmission Spectrophotometry
The FilmTek™ 3000M combined reflection-transmission metrology system was developed for efficient and accurate measurement of patterned films deposited on transparent substrates. The FilmTek™ 3000M utilizes allows for a small spot size down to 2 µm, and can be equipped with a large custom stage for flat panel display applications.
Conventional optical metrology systems which utilize a high power objective for sub-15µm spot measurements are prone to significant signal degradation and optical artifacts, limiting their use for patterned samples, non-uniform films, and thick films. The patented optical design of FilmTek™ 3000M maintains high signal fidelity even during small spot measurements by allowing for a sub-10µm spot with a low power objective. Avoiding the use of a high power objective is critical for limiting the angular spectrum of the collected light and maximizing the coherence of both spectral reflection and transmission.
FilmTek™ 3000M capabilities can be expanded to perform fully-automated imaging-based critical dimension (CD) measurement of patterned samples. This option allows for simultaneous CD and film thickness measurement.
FilmTek™ 3000M is a fully-integrated package, with advanced material modeling software to make even the most rigorous of measurement tasks reliable and intuitive.
- Spectroscopic reflection
- Spectroscopic transmission
- 5nm to 350µm film thickness range
- 2µm spot size (5×10µm standard)
- Automated stage with autofocus
- Camera for imaging measurement location
- Pattern recognition
FilmTek™ 3000M incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of:
- Multiple layer thicknesses
- Indices of refraction [ n(λ) ]
- Extinction (absorption) coefficients [ k(λ) ]
- Energy band gap [ Eg ]
- Critical dimension (CD) measurement
- Automated flat panel/wafer handling
- Flat panel total thickness variation (TTV) measurement
|Film thickness range:||5nm to 350µm (5nm to 150µm is standard)|
|Film thickness accuracy:||±1.5Å for NIST traceable standard oxide 1000Å to 1µm|
|CD precision (1σ):||<0.2%|
|Spectral range:||380nm to 1700nm ( 380nm to 1000nm is standard)|
|Measurement spot size:||2µm (5×10µm standard with 10x objective)|
|Sample size:||2mm to 600mm (150mm is standard)|
|Light source:||Regulated halogen lamp (2,000 hrs lifetime)|
|Detector type:||2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR)|
|Computer:||Multi-core processor with Windows™ 7 Operating System|
|Measurement time:||<1 sec per site (e.g., oxide film)|
|Film(s)||Thickness||Measured Parameters||Precision (1σ)|
|Oxide / Si||50-1000 nm||t||0.025 nm|