Micro-spot Spectroscopic Reflectometry
The FilmTek™ 2000M micro-spot size benchtop metrology system is engineered for unparalleled versatility and high performance, meeting the needs of patterned film applications requiring a very small spot size. The FilmTek™ 2000M allows for measurement spot sizes as small as 2µm, and delivers reliable measurement of both thin and thick films.
Conventional optical metrology systems which utilize a high power objective for sub-15µm spot measurements are prone to significant signal degradation and optical artifacts, limiting their use for patterned wafers, non-uniform films, and thick films. The patented optical design of FilmTek™ 2000M maintains high signal fidelity even during small spot measurements by allowing for a sub-10µm spot with a low power objective. Avoiding the use of a high power objective is critical for limiting the angular spectrum of the collected light and maximizing the coherence of the spectral reflection.
FilmTek™ 2000M capabilities can be expanded to perform fully-automated imaging-based critical dimension (CD) measurement of patterned wafers. This option allows for simultaneous CD and film thickness measurement.
FilmTek™ 2000M is a fully-integrated package, with advanced material modeling software to make even the most rigorous of measurement tasks reliable and intuitive. Addition of an optional wafer auto-loader provides high-throughput, fully-automated mapping of patterned wafers.
- 5nm to 350µm film thickness range
- 2µm spot size (5×10µm standard)
- Automated stage with autofocus
- Camera for imaging measurement location
- Pattern recognition
FilmTek™ 2000M incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of:
- Multiple layer thicknesses
- Indices of refraction [ n(λ) ]
- Extinction (absorption) coefficients [ k(λ) ]
- Energy band gap [ Eg ]
- Critical dimension (CD) measurement
- Automated wafer handling
|Film thickness range:||5nm to 350µm (5nm to 150µm is standard)|
|Film thickness accuracy:||±1.5Å for NIST traceable standard oxide 1000Å to 1µm|
|CD precision (1σ):||<0.2%|
|Spectral range:||380nm to 1700nm ( 380nm to 1000nm is standard)|
|Measurement spot size:||2µm (5×10µm standard with 10x objective)|
|Sample size:||2mm to 300mm (150mm is standard)|
|Light source:||Regulated halogen lamp (2,000 hrs lifetime)|
|Detector type:||2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR)|
|Computer:||Multi-core processor with Windows™ 7 Operating System|
|Measurement time:||<1 sec per site (e.g., oxide film)|
|Film(s)||Thickness||Measured Parameters||Precision (1σ)|
|Oxide / Si||50-1000 nm||t||0.025 nm|