Graphene, the single layer of graphite, has been the focus of many researchers internationally because of its unique electronic properties. The characterization of graphene films deposited on various substrates other than SiO2 has been a challenging task thus far. This article discusses a rapid, sensitive, and non-destructive method for characterization of graphene on various substrates, including silicon, based on combined reflectometry and ellipsometry techniques (FilmTek™ 2000 PAR-SE). The optical properties deduced from the multi-angle, polarized light measurements in the range of 190–1000nm suggest that multi-layer graphite is a birefringent material with thickness-dependent optical properties.

Combined reflectometry-ellipsometry technique to measure graphite down to monolayer thickness