FilmTekā„¢ Advantages

  • The high index and thickness resolution of the FilmTekā„¢ 4000 allows film properties to be accurately characterized as a function of temperature.
  • Measure dn/dT and thermal expansion coefficients for new materials.
  • Thermal characterization of films provides a quick measure of environmental stability for process research and development.


Measured Index of Refraction and Thickness versus Temperature of SiO2 on Silicon


Film p25

Film p31