FilmTek™ Advantages

  • The high index and thickness resolution of the FilmTek™ 4000 allows film properties to be accurately characterized as a function of temperature.
  • Measure dn/dT and thermal expansion coefficients for new materials.
  • Thermal characterization of films provides a quick measure of environmental stability for process research and development.

 

Measured Index of Refraction and Thickness versus Temperature of SiO2 on Silicon

 

Film p25

Film p31