FilmTek 3000M

Micro-spot size metrology system developed for efficient and accurate measurement of patterned films deposited on transparent substrates. Allows for a spot size down to 2 µm, and can be equipped with a large custom stage for flat panel display applications. Capabilities can be expanded to perform fully-automated imaging-based critical dimension (CD) measurement of patterned samples.

FilmTek 3000 PAR-SE

Engineered to meet the needs of any advanced thin film measurement application, excelling at material characterization on both transparent and non-transparent substrates. Combines spectroscopic ellipsometry, DUV multi-angle polarized reflectometry, and transmission measurement with a wide spectral range to to meet the most challenging of measurement demands in both R&D and production. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.

FilmTek 3000 PAR

Metrology system with a 50µm spot that delivers high-performance transmission and reflection measurement of patterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films.

FilmTek 2000M

Micro-spot size benchtop metrology system engineered for unparalleled versatility and high performance, meeting the needs of patterned film applications requiring a very small spot size. Allows for measurement spot sizes as small as 2µm, and delivers reliable measurement of both thin and thick films.

FilmTek 3000 SE

Benchtop metrology system delivering unmatched measurement performance, versatility, and speed for unpatterned thin to thick film applications. Ideally suited for academic and R&D settings. Combines spectroscopic rotating compensator ellipsometry, multi-angle polarized spectroscopic reflection, and transmission measurement capabilities to meet the needs of nearly any flat panel display application.

FilmTek 3000

Delivers efficient and accurate transmission and reflection measurement of unpatterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films. Configured with large-scale automated stage for flat panel display applications.