FilmTek SE

Spectroscopic Ellipsometry with 0.03 Å Repeatability on Native Oxide

Spectroscopic Ellipsometer for film thickness measurement

The FilmTek™ SE spectroscopic ellipsometer delivers unmatched measurement performance and speed for thin film applications at a very low cost. FilmTek™ SE provides automated measurement of film thickness, refractive index, and extinction coefficient, and is ideally suited for academic and R&D settings.

Our advanced rotating compensator design allows for precision and accuracy throughout the full range of delta (Δ), including near 0° and 180°. This allows for optimal performance when measurements are not possible near the Brewster condition, a feature essential for accurate measurement of very thin films on silicon or glass substrates.

Measurement is efficient and easy. Thousands of wavelengths are simultaneously collected in seconds, and the integrated auto-focus feature eliminates the tedious task of manual sample alignment required by comparable ellipsometers.

The FilmTek™ SE is a fully-integrated package, paired with intuitive material modeling software to make even the most demanding of measurement tasks simple and reliable. FilmTek™ software includes fully user-customizable sample mapping capabilities to rapidly generate 2D and 3D data maps of any measured parameter. In addition to user-defined patterns, standard map patterns include polar, X-Y, rθ, or linear.

Key Features:

  • Spectroscopic ellipsometry with rotating compensator design (390nm-950nm)
  • Automated stage with autofocus
  • Ideal for measuring ultra-thin films (0.03 Å repeatability on native oxide)
  • Affordable for nearly any budget

Measurement Capabilities:

FilmTek™ SE spectroscopic ellipsometer incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of:

  • Multiple layer thicknesses
  • Indices of refraction [ n(λ) ]
  • Extinction (absorption) coefficients [ k(λ) ]
  • Energy band gap [ Eg ]


Virtually all translucent films ranging in thickness from 1 angstrom to approximately 50 microns can be measured with high precision. Typical applications include:

  • Semiconductor and dielectric materials
  • Multilayer optical coatings
  • Optical antireflection coatings
  • Thin metals
  • Solar cells

Example Films

  • SiOx
  • SiNx
  • DLC
  • SOG
  • Photoresist
  • Thin metals
  • a-Si
  • a-C:H
  • ITO
  • Polysilicon
  • Polyimide
  • Low k dielectric films


Technical Specifications
Film thickness range: 0Å to 50µm
Film thickness accuracy: ±1.0Å for NIST traceable standard oxide 100Å to 1µm
Spectral range: 380nm to 950nm
Measurement spot size: 3mm
Sample size: 2mm to 300mm (150mm standard)
Spectral resolution: 0.3nm
Light source: Regulated halogen lamp (10,000 hrs lifetime)
Detector type: 2048 pixel silicon CCD array
Automated Stage with Auto Focus 300mm (200mm is standard)
Computer: Multi-core processor with Windows™ 7 Operating System
Measurement time: ~2 sec (e.g., oxide film)


Performance Specifications
Film(s) Thickness Measured Parameters Precision (1σ)
Oxide / Si 0-1000 Å t 0.03 Å
1000-500,000 Å t 0.005%
1000 Å t , n 0.2 Å / 0.0001
15,000 Å t , n 0.5 Å / 0.0001
150,000 Å t , n 1.5 Å / 0.00001
Photoresist / Si 200-10,000 Å t 0.02%
500-10,000 Å t , n 0.05% / 0.0002
Nitride / Si 200-10,000 Å t 0.02%
500-10,000 Å t , n 0.05% / 0.0005
Polysilicon / Oxide / Si 200-10,000 Å t Poly , t Oxide 0.2 Å / 0.1 Å
500-10,000 Å t Poly , t Oxide 0.2 Å / 0.0005