FilmTek 3000

DUV-NIR Reflection and Transmission Spectrophotometry

DUV-NIR Reflection and Transmission Spectrophotometry for film thickness measurement

The FilmTek™ 3000 combined reflection-transmission spectrophotometer provides efficient and accurate transmission and reflection measurement of unpatterned films deposited on transparent substrates. It is ideally suited for measuring the thickness and optical constants of very thin absorbing films.

FilmTek™ 3000 is a fully-integrated package, combining DUV-NIR fiber-optic spectrophotometers, an automated stage, and advanced material modeling software to make even the most rigorous of measurement tasks reliable and intuitive.

FilmTek™ software includes fully user-customizable mapping capabilities to rapidly generate 2D and 3D data maps of any measured parameter. In addition to user-defined patterns, standard map patterns include polar, X-Y, rθ, or linear.

FilmTek™ 3000 can be further configured to meet more specific measurement needs, including large-scale automated stages for flat panel display applications.
When equipped with the polarimetry option, FilmTek™ 3000P combines spectroscopic reflection, transmission, and polarimetry measurements for the accurate and simultaneous determination of optical constants and birefringence.

Measurement Capabilities:

FilmTek™ 3000 incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of:

  • Multiple layer thicknesses
  • Indices of refraction [ n(λ) ]
  • Extinction (absorption) coefficients [ k(λ) ]
  • Energy band gap [ Eg ]
  • Constituent, void fraction
  • Surface roughness

Optional Features:

  • Large custom stages for flat panel display applications
  • Automated sample handling


Virtually all translucent films ranging in thickness from less than 100 angstroms to approximately 150 microns can be measured with high precision. Typical applications include:

  • Flat panel display
  • Dielectric materials
  • Multilayer optical coatings
  • Optical antireflection coatings
  • Electro-optical materials
  • OLED
  • Solar cell
  • Coated glass
  • Laser mirrors
  • Thin metals

Example Films

  • SiOx
  • SiNx
  • DLC
  • SOG
  • Photoresist
  • Thin metals
  • Polysilicon
  • Polyimide
  • Color dye
  • a-Si
  • a-C:H
  • ITO
  • Alq3
  • HIL
  • BEML
  • GEML
  • GETL
  • REML

Technical Specifications
Film thickness range: 3nm to 150µm
Film thickness accuracy: ±1.5Å for NIST traceable standard oxide 1000Å to 1µm
Spectral range: 220nm to 1700nm (240nm to 1000nm is standard)
Measurement spot size: 3mm
Sample size: 2mm to 500mm (150mm is standard. Larger stages upon request)
Spectral resolution: 0.3-2nm
Light source: Regulated deuterium-halogen lamp (2,000 hrs lifetime)
Detector type: 2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR)
Computer: Multi-core processor with Windows™ 7 Operating System
Measurement time: <1 sec per site (e.g., oxide film)


Performance Specifications
Film(s) Thickness Measured Parameters Precision (1σ)
Oxide / Si 200-500 Å t 0.5 Å
500-10,000 Å t 0.25 Å
1000 Å t , n 0.25 Å / 0.001
Nitride / Si 200-10,000 Å t 0.5 Å
Photoresist / Si 200-10,000 Å t 0.5 Å
a-Si / Oxide / Si 200-10,000 Å t 0.5 Å